Bipolar Pulsed Dc Power Supply

Achieve new levels of process performance using field proven bipolar dc pulsing technology.

Bipolar pulsed dc power supply.

Ascent ap series unprecedented power control for single and dual magnetron sputtering. They have a more heavily designed output resistor to withstand a pulsed load and a regulating circuit optimized for fast switching over between current and voltage regulation and vice versa. Combining standard dc technology and our patented pulsed dc technology the pinnacle plus power supplies provide higher deposition rates. The power supply works as a voltage source negative pulse amplitude can be adjusted in the range of 20 to 200v dc the positive pulse amplitude is within the range of 15 to 50v dc and is proportional to the negative pulse current magnitude.

Bipolar pulsed power supplies model magpuls bp the bipolar pulsed power supplies model magpuls bp are constructed for plasma excitation with highest performance. The bipolar pulsed power supply is a modular designed system consisting of the dc power unit and the bipolar pulse unit which switches the voltage with a freely adjustable pulse of. Advanced waveform control allows process fine tuning. Advanced energy pinnacle plus power supplies provide all the advantages of a pulsed dc solution for reactive processes in an easily integrated package that increases process efficiency reduces costs and offers superior flexibility and latitude.

Structural characterization of the coatings was done. Dc power supplies for sputtering plants and ion sources pulse generators as one of the leading manufacturers of power supplies for thin film coating systems adl analoge und digitale leistungselektronik gmbh offers its customers innovative solutions for complex processes. Available for both dual pulsed and single pulsed magnetron sputtering applications. Since the second half of 2006 we developed our own design of asymmetric bipolar pulsed bias power supply.

With the new cp20 248 the manufacturer from. Ac bipolar pulsed power supply for reactive magnetron sputtering article pdf available in ieee transactions on plasma science 39 10 1983 1989 november 2011 with 529 reads how we measure. The capacitor charging high voltage dc power supplies are designed specifically to the requirements of capacitor charging or capacitor conditioning i e. The rpdg line eliminates yield limiting factors thus enabling existing pvd tools to produce the high quality low defect films needed for next.